Overview
- The draft MATCH Act, introduced Thursday, would tighten U.S. controls on semiconductor manufacturing equipment bound for China.
- The proposal targets immersion DUV lithography, the light-based machines that print chip circuits, a niche led by ASML with a smaller role for Nikon.
- It would bar the sale and servicing of the targeted tools to leading Chinese chipmakers including SMIC, Hua Hong, Huawei, CXMT, and YMTC.
- Lawmakers aim to stop even older DUV systems still reaching Chinese fabs, expanding beyond current Dutch rules that already block the most advanced models.
- Backers call for the Netherlands and Japan to adopt matching limits, while ASML and the Dutch foreign ministry declined comment and ASML shares slipped as investors weighed China exposure.