Samsung Buys Two ASML High-NA EUV Tools to Power 2nm Push

Overview

• Samsung will spend roughly KRW1.1 trillion (about US$773 million) on two advanced ASML lithography machines, with at least one identified as the Twinscan EXE:5200B.
• According to the reports, one unit is expected to arrive later this year and the second in the first half of 2026.
• The tools are slated for 2nm manufacturing, including lines producing the Exynos 2600, and Samsung previously trialed a research-use High-NA system earlier this year.
• High-NA EUV (NA 0.55) can pattern features about 1.7 times finer with near threefold transistor density gains versus conventional EUV, enabling tighter scaling at advanced nodes.
• Rivals have already moved: Intel received a production EXE:5200B in July 2025, and SK hynix installed one at its Icheon M16 fab a month later.