Overview
- Applied Materials introduced the Centris Spectral SiN ALD for silicon‑nitride deposition and the Producer Selectra Mo Etch for molybdenum removal in tall 3D structures, addressing tighter material and etch control needed for next‑generation logic and high‑layer NAND.
- The company said the Selectra Mo Etch has been validated in high‑volume manufacturing, a milestone that can shorten customer adoption timelines for complex 3D chip processes.
- Applied reported record Q2 revenue of $7.91 billion, raised its 2026 semiconductor equipment growth outlook to more than 30%, and cited extended customer booking visibility that supports multi‑year demand forecasts.
- Investors and analysts reacted positively: the stock climbed to near recent peaks and brokerages including Barclays and Cantor Fitzgerald raised price targets and kept Overweight ratings.
- Analysts note risks to watch are rich valuation multiples, a sharp recent stock run, a large drop in near‑term free cash flow and insider share sales, and future adoption will hinge on wider high‑volume validation and sustained customer capex.